Determination of the Grain Boundary Diffusion Coefficients in Thin Film Au-Ag Couples by Auger Electron Spectroscopy

1985 ◽  
pp. 170-171 ◽  
Author(s):  
Antoni Bukaluk
Keyword(s):  
Thin Film ◽  
Grain Boundary ◽  
Auger Electron Spectroscopy ◽  
Diffusion Coefficients ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Boundary Diffusion ◽  
Grain Boundary Diffusion

Determination of grain-boundary diffusion coefficients by Auger electron spectroscopy

2000 ◽  
Vol 162-163 ◽  
pp. 213-218 ◽  
Author(s):  
Z. Erdélyi ◽  
Ch. Girardeaux ◽  
G.A. Langer ◽  
L. Daróczi ◽  
A. Rolland ◽  
...  
Keyword(s):  
Grain Boundary ◽  
Auger Electron Spectroscopy ◽  
Diffusion Coefficients ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Boundary Diffusion ◽  
Grain Boundary Diffusion

Investigation of Ta grain boundary diffusion in copper by means of Auger electron spectroscopy

2004 ◽  
Vol 459 (1-2) ◽  
pp. 303-307 ◽  
Author(s):  
G Erdélyi ◽  
G Langer ◽  
J Nyéki ◽  
L Kövér ◽  
C Tomastik ◽  
...  
Keyword(s):  
Grain Boundary ◽  
Auger Electron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Boundary Diffusion ◽  
Grain Boundary Diffusion

Investigation of grain-boundary diffusion of nickel in molybdenum by auger electron spectroscopy

1992 ◽  
Vol 35 (7) ◽  
pp. 611-614 ◽  
Author(s):  
I. V. Ratochka ◽  
V. B. Marvin ◽  
I. K. Zverev ◽  
V. M. Adeev ◽  
Yu. N. Ivashchenko ◽  
...  
Keyword(s):  
Grain Boundary ◽  
Auger Electron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Boundary Diffusion ◽  
Grain Boundary Diffusion

scholarly journals Determination of Grain Boundary Diffusion Coefficients in C-Regime by Hwang-Balluffi Method: Silver Diffusion in Pd

2009 ◽  
Vol 289-292 ◽  
pp. 763-767 ◽  
Author(s):  
Z. Balogh ◽  
Z. Erdélyi ◽  
Dezső L. Beke ◽  
Alain Portavoce ◽  
Christophe Girardeaux ◽  
...  
Keyword(s):  
Grain Boundary ◽  
Diffusion Coefficients ◽  
Boundary Diffusion ◽  
Grain Boundary Diffusion ◽  
Controlled Processes ◽  
Diffusion Controlled ◽  
Arrhenius Function ◽  
Data Points ◽  
Accumulation Kinetics

Diffusion controlled processes play a crucial role in the degradation of technical materials. At low temperatures the most significant of them is the diffusion along grain boundaries. In thin film geometry one of the best methods for determining the grain boundary (GB) diffusion coefficient of an impurity element is the Hwang-Balluffi method, in which a surface sensitive technique is used to follow the surface accumulation kinetics. Results of grain boundary diffusion measurements, carried out in our laboratory by this method in three different materials systems (Ag/Pd, Ag/Cu and Au/Ni) are reviewed. In case of Ag diffusion along Pd GBs the surface accumulation was followed by AES method. The data points can be well fitted by an Arrhenius function with an activation energy Q=0.99eV

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