Diamond growth on CoSi2/Si by bias-enhanced microwave plasma chemical vapor deposition method

Materials Chemistry and Physics ◽

10.1016/s0254-0584(01)00430-8 ◽

2001 ◽

Vol 72 (2) ◽

pp. 172-175 ◽

Author(s):

Mao Rong Chen ◽

Li Chang ◽

Der Fu Chang ◽

Hou Guang Chen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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The structural and surface properties of carbon nanotube synthesized by microwave plasma chemical vapor deposition method for superhydrophobic coating

Thin Solid Films ◽

10.1016/j.tsf.2013.05.018 ◽

2013 ◽

Vol 546 ◽

pp. 94-97 ◽

Author(s):

Jae-Hyeong Lee ◽

Su Ho Lee ◽

Doyoung Kim ◽

Yong Seob Park

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Superhydrophobic Coating ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Influence of Sr Content on Tl-Ba-Sr-Ca-Cu-O Superconducting Thin Films Prepared by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l109 ◽

1995 ◽

Vol 34 (Part 2, No. 1B) ◽

pp. L109-L111 ◽

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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The effect of Pb addition on Bi-Sr-Ca-Cu-O superconducting thin films prepared by the mist microwave-plasma chemical vapor deposition method

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90008-6 ◽

1994 ◽

Vol 144 (1-2) ◽

pp. 48-53 ◽

Author(s):

Naoyuki Takahashi ◽

Akinori Koukito ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Relationship between crystal structures and Pb addition of TlSrCaCuO superconducting thin films prepared by the mist microwave plasma chemical vapor deposition method

Journal of Crystal Growth ◽

10.1016/0022-0248(95)00038-0 ◽

1995 ◽

Vol 151 (3-4) ◽

pp. 300-304

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of nanosized Mo powder by microwave plasma chemical vapor deposition method

Materials Chemistry and Physics ◽

10.1016/s0254-0584(99)00007-3 ◽

1999 ◽

Vol 59 (3) ◽

pp. 204-209 ◽

Author(s):

Binghai Liu ◽

Hongchen Gu ◽

Qilin Chen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method

Vacuum ◽

10.1016/0042-207x(91)91244-i ◽

1991 ◽

Vol 42 (8-9) ◽

pp. 603-604

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Deposited Films

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Preparation of Tl-System Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6518 ◽

1994 ◽

Vol 33 (Part 1, No. 12A) ◽

pp. 6518-6524 ◽

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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