Enhancement of process efficacy using seed plasma in pulsed high-voltage glow-discharge plasma implantation

2002 ◽  
Vol 303 (1) ◽  
pp. 67-71 ◽  
Author(s):  
X.B Tian ◽  
P Peng ◽  
Paul K Chu
2000 ◽  
Vol 647 ◽  
Author(s):  
S. Miyagawa ◽  
Y. Miyagawa

AbstractPlasma based ion implantation (PBII) with bipolar high voltage pulses has been proposed to improve a dose uniformity in an ion implantation on a three-dimensional target. A pulsed glow discharge plasma is produced around the target by a positive high-voltage pulse, and then ions are implanted into the target from all sides by the subsequent negative high-voltage pulse. A time resolved plasma density and the spatial profiles of the pulsed glow discharge plasma are measured by a Langmuir probe in a boxcar mode, and diamond like carbon (DLC) films are deposited under optimal conditions of the pulsed plasma. It is shown that the PBII with bipolar pulses is a useful method in depositing DLC films on the three-dimensional target. A carbon ion implantation procedure results in the enhanced adherence of DLC coating to the target, and the enhanced adhesion is due to a graded carbon interface produced by carbon implantation.


2009 ◽  
Vol 203 (17-18) ◽  
pp. 2751-2754 ◽  
Author(s):  
Xiubo Tian ◽  
Chunzhi Gong ◽  
Lei Liu ◽  
Shiqin Yang ◽  
Ricky K.Y. Fu ◽  
...  

2020 ◽  
Vol 1686 ◽  
pp. 012013
Author(s):  
V.N. Arustamov ◽  
R.KH. Ashurov ◽  
V.M. Rotchtein ◽  
KH.B. Ashurov ◽  
I.KH. Khudaykulov

Author(s):  
S. Kh. Ali ◽  
Kh. M. Ali ◽  
E. A. Bezrukov ◽  
S. V. Belov ◽  
Yu. K. Danyleiko ◽  
...  

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