Enhancement of biocompatibility of diamond-like carbon films implanted with phosphorus utilizing pulsed high-voltage glow discharge plasma immersion ion implanation and deposition

2004 ◽  
Author(s):  
S.C.H. Kwok ◽  
P.K. Chu ◽  
M.M.M. Biiek ◽  
D.R. McKenzie
Keyword(s):  
Glow Discharge ◽  
High Voltage ◽  
Discharge Plasma ◽  
Carbon Films ◽  
Glow Discharge Plasma ◽  
Diamond Like Carbon ◽  
Ion Implanation

Deposition of Diamond-Like Carbon Films using Plasma Based Ion Implantation with Bipolar Pulses

2000 ◽  
Vol 647 ◽  
Author(s):  
S. Miyagawa ◽  
Y. Miyagawa
Keyword(s):  
Glow Discharge ◽  
Ion Implantation ◽  
High Voltage ◽  
Voltage Pulse ◽  
Discharge Plasma ◽  
Three Dimensional ◽  
High Voltage Pulse ◽  
Glow Discharge Plasma ◽  
Diamond Like Carbon ◽  
Pulsed Glow Discharge

AbstractPlasma based ion implantation (PBII) with bipolar high voltage pulses has been proposed to improve a dose uniformity in an ion implantation on a three-dimensional target. A pulsed glow discharge plasma is produced around the target by a positive high-voltage pulse, and then ions are implanted into the target from all sides by the subsequent negative high-voltage pulse. A time resolved plasma density and the spatial profiles of the pulsed glow discharge plasma are measured by a Langmuir probe in a boxcar mode, and diamond like carbon (DLC) films are deposited under optimal conditions of the pulsed plasma. It is shown that the PBII with bipolar pulses is a useful method in depositing DLC films on the three-dimensional target. A carbon ion implantation procedure results in the enhanced adherence of DLC coating to the target, and the enhanced adhesion is due to a graded carbon interface produced by carbon implantation.

LOW HYDROGEN CONTENT HYDROGENATED AMORPHOUS CARBON FILMS USING DIRECT CURRENT GLOW DISCHARGE PLASMA CVD

2002 ◽  
Vol 16 (06n07) ◽  
pp. 860-865 ◽  
Author(s):  
MANJU MALHOTRA ◽  
SATYENDRA KUMAR
Keyword(s):  
Glow Discharge ◽  
Amorphous Carbon ◽  
Hydrogen Content ◽  
Discharge Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Glow Discharge Plasma ◽  
Chemical Vapor Deposition Method ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

We report on the growth of hydrogenated amorphous carbon (a-C:H) films, using a simple dc glow discharge plasma chemical vapor deposition method. A variety of complementary techniques were employed to analyze the properties of these films. a-C:H films having high fraction of tetrahedrally ( sp 3) bonded carbon atoms (~ 70%) and low hydrogen content (< 5at.%) were obtained. These films were characterized by a high optical bandgap ~ 2.7 eV, and refractive index (at 600nm) ~ 2.2. Growth of metastable diamond structure in a-C:H is attributed to energetic condensation of carbon containing ions in ( sp 3) configuration.

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