Dependence of electrically detected magnetic resonance signal shape from iron-contaminated silicon wafers on the thermal treatment of the samples

1999 ◽  
Vol 273-274 ◽  
pp. 404-407 ◽  
Author(s):  
T. Mchedlidze ◽  
K. Matsumoto ◽  
T.-C. Lin ◽  
M. Suezawa
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