Short range order structures in fcc-based Ni–Mo studied by high resolution transmission electron microscopy with image processing

2001 ◽  
Vol 312 (1-2) ◽  
pp. 160-167 ◽  
Author(s):  
S Hata ◽  
T Mitate ◽  
N Kuwano ◽  
S Matsumura ◽  
D Shindo ◽  
...  
Author(s):  
J.C. Barry ◽  
R.S. Timsit ◽  
D. Landheer

Tantalum-aluminium thin films have assumed considerable technological importance since the discovery in the late 1960's that the films are useful in the fabrication of thin film resistors and capacitors. It is generally claimed that these films, when prepared by co-sputtering Ta and Al, are amorphous over a range of Ta concentrations extending approximately from 15 to 75 at%, and are crystalline beyond this range. Diffuse electron diffraction patterns and ‘mottle pattern’ transmission electron micrographs are typical characteristics of the amorphous phase. In this present study we have attempted to identify any atomic short range order in the amorphous Ta-Al films and to follow the changes in this order as the Ta concentration increases across the amorphous/crystalline transition. The co-sputtered Ta-Al films of ≈100A thickness were examined in a high resolution 4000EX electron microscope (top entry, ±15°(x,y) tilt, Cs = 1.0mm ) at 400kV.


2012 ◽  
Vol 18 (S5) ◽  
pp. 3-4 ◽  
Author(s):  
M. C. Proença ◽  
J. F. Moura Nunes ◽  
A. P. Alves de Matos

Automatic image processing of transmission electron microscopy images (TEM) is a utopia often pursued, considering the thousands of images necessary to ensure a high resolution 3D reconstruction of virus particles or other macromolecular machines.


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