Hydrogenated amorphous carbon films deposited in an electron cyclotron resonance–chemical vapor deposition discharge reactor using acetylene

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00252-6 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 654-657 ◽

Author(s):

B.K. Kim ◽

T.A. Grotjohn

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous

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Effect of pressure on the deposition of hydrogenated amorphous carbon films using the electron cyclotron resonance chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581073 ◽

1998 ◽

Vol 16 (2) ◽

pp. 572-577 ◽

Author(s):

Rusli ◽

S. F. Yoon ◽

H. Yang ◽

Q. Zhang ◽

J. Ahn ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Effect Of Pressure ◽

Hydrogenated Amorphous

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Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition

Acta Physica Sinica ◽

10.7498/aps.55.2572 ◽

2006 ◽

Vol 55 (5) ◽

pp. 2572

Author(s):

Wu Zhen-Yu ◽

Yang Yin-Tang ◽

Wang Jia-You

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films

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Nitrogenated amorphous carbon films synthesized by electron cyclotron resonance plasma enhanced chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00017-5 ◽

1999 ◽

Vol 8 (8-9) ◽

pp. 1732-1736 ◽

Author(s):

W.-C. Chan ◽

M.-K. Fung ◽

I. Bello ◽

C.-S. Lee ◽

S.-T. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Resonance Plasma

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Structure and Electrical Studies of Fluorinated Amorphous Carbon Films Prepared by Electron Cyclotron Resonance/Chemical-Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.3598 ◽

2003 ◽

Vol 42 (Part 1, No. 6A) ◽

pp. 3598-3602 ◽

Author(s):

Kun Ping Huang ◽

Pang Lin ◽

Han C. Shih

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Electrical Studies

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Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.03.107 ◽

2011 ◽

Vol 206 (5) ◽

pp. 1007-1010 ◽

Author(s):

X.R. Deng ◽

Y.X. Leng ◽

X. Dong ◽

H. Sun ◽

Nan Huang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogen Flow ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Materials Science and Engineering A ◽

10.1016/s0921-5093(99)00566-3 ◽

2000 ◽

Vol 277 (1-2) ◽

pp. 57-63 ◽

Author(s):

Ho J. Ryu ◽

Sung H. Kim ◽

Soon H. Hong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Pressure ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effects of process parameters on the structure of hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.02.012 ◽

2010 ◽

Vol 204 (18-19) ◽

pp. 3029-3033 ◽

Author(s):

Dong Xie ◽

Hengjun Liu ◽

Xingrui Deng ◽

Y.X. Leng ◽

Nan Huang

Keyword(s):

Chemical Vapor Deposition ◽

Process Parameters ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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On the microstructural, optical and mechanical properties of hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00288-5 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 752-755 ◽

Author(s):

O. Durand-Drouhin ◽

A. Zeinert ◽

M. Benlahsen ◽

K. Zellama ◽

R. Kré ◽

...

Keyword(s):

Mechanical Properties ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Optical And Mechanical Properties ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00360-5 ◽

2000 ◽

Vol 9 (12) ◽

pp. 2024-2030 ◽

Author(s):

S.F. Yoon ◽

K.H. Tan ◽

J. Rusli ◽

Ahn ◽

Q.F. Huang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Power ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon

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