scholarly journals The self-focusing condition of a charged particle beam in a resistive plasma

2021 ◽  
Vol 87 (5) ◽  
Author(s):  
Xiao-Chuan Ning ◽  
Tian-Yi Liang ◽  
D. Wu ◽  
Zheng-Mao Sheng
Keyword(s):  
Charged Particle ◽  
Plasma Heating ◽  
Particle Beam ◽  
The Self ◽  
Beam Radius ◽  
Charged Particle Beam ◽  
Beam Focusing ◽  
Self Focusing ◽  
Focusing Distance ◽  
Resistive Plasma

The self-focusing condition of a charged particle beam in a resistive plasma has been studied. When plasma heating is weak, the beam focusing is intensified by increasing the beam density or velocity. However, when plasma heating is strong, the beam focusing is only determined by the beam velocity. Especially, in weak heating conditions, the beam trends to be focused into the centre as a whole, and in strong heating conditions, a double-peak structure with a hollow centre is predicted to appear. Furthermore, it is found that the beam radius has a significant effect on focusing distance: a larger the beam radius will result in a longer focusing distance. Simulation results also show that when the beam radius is large enough, filamentation of the beam appears. Our results will serve as a reference for relevant beam–plasma experiments and theoretical analyses, such as heavy ion fusion and ion-beam-driven high energy density physics.

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

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