Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane
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1990 ◽
Vol 8
(6)
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pp. 1177
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1992 ◽
Vol 10
(2)
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pp. 625
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1995 ◽
Vol 142
(11)
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pp. 3873-3880
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1995 ◽
Vol 142
(2)
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pp. 676-682
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1980 ◽
Vol 127
(10)
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pp. 2222-2227
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