Two-Stage Atomic Layer Deposition of Aluminum Oxide on Alkanethiolate Self-Assembled Monolayers Usingn-Propanol and Water as Oxygen Sources

2008 ◽  
Vol 20 (16) ◽  
pp. 5356-5360 ◽  
Author(s):  
Nobuhiko P. Kobayashi ◽  
R. Stanley Williams
RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.


2004 ◽  
Vol 811 ◽  
Author(s):  
Rong Chen ◽  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Stacey F. Bent

ABSTRACTA series of self-assembled molecules have been investigated as deactivating agents for the HfO2 atomic layer deposition (ALD). Three important factors of self-assembled monolayers (SAMs) deactivating efficiency towards ALD--chain length, reactivity and steric effect--have been investigated and discussed as well as the initial blocking mechanism of this process. This investigation shows that in order to achieve satisfactory deactivation, it is crucial to choose high reactivity, low steric effect molecules with certain chain length to form condensed, high hydrophobic organic monolayers.


ACS Nano ◽  
2011 ◽  
Vol 5 (6) ◽  
pp. 5223-5232 ◽  
Author(s):  
Justice M. P. Alaboson ◽  
Qing Hua Wang ◽  
Jonathan D. Emery ◽  
Albert L. Lipson ◽  
Michael J. Bedzyk ◽  
...  

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