In situ high resolution electron microscopy/electron energy loss spectroscopy observation of wetting of a Si surface by molten Al

2001 ◽  
Vol 203 (1) ◽  
pp. 17-21 ◽  
Author(s):  
S. Tsukimoto ◽  
S. Arai ◽  
M. Konno ◽  
T. Kamino ◽  
K. Sasaki ◽  
...  
2002 ◽  
Vol 746 ◽  
Author(s):  
J.-L. Maurice ◽  
F. Pailloux ◽  
D. Imhoff ◽  
J.-P. Contour ◽  
A. Barthélémy ◽  
...  

ABSTRACTWe use High Resolution Electron Microscopy together with Electron Energy Loss Spectroscopy to analyze the crystallography and the chemical configuration of a Co/SrTiO3 interface in a Co/SrTiO3/La2/3Sr1/3MnO3 magnetic tunnel junction.PACS: 75.47.-m, 75.70.Cn, 68.37.Lp, 79.20.Uv


2000 ◽  
Vol 6 (S2) ◽  
pp. 12-13
Author(s):  
Renu Sharma ◽  
Peter Crozier

CeO2 is an important material in many catalyst applications. CeO2, PrO2 and TbO2 are the only lanthanides known to exist as oxides in both 3+ and 4+ oxidation states. The high oxygen mobility at low temperature (≈300°C) results in easy oxidation-reduction cycles; a property utilized in the catalyst industry, especially for CeO2. Studying the oxidation-reduction behavior is thus very important to understanding the reactivity of CeO2 as a catalyst. We have studied CeO2 by in situ electron diffraction, high resolution electron microscopy (HREM) and electron energy-loss spectroscopy (EELS), not only to understand the reduction behavior but also to develop a method to quantify the reducibility of CeO2 or mixed oxides containing CeO2 by EELS. We have applied this method to study the behavior of ZrO2-CeO2 catalyst during reduction.Experiments were performed on a PHILIPS-430 electron microscope operated at 300KV, fitted with a differentially pumped environmental cell and a Gatan Imaging Filter (GIF).


Author(s):  
T. Dewolf ◽  
D. Cooper ◽  
N. Bernier ◽  
V. Delaye ◽  
A. Grenier ◽  
...  

Abstract Forming and breaking a nanometer-sized conductive area are commonly accepted as the physical phenomenon involved in the switching mechanism of oxide resistive random access memories (OxRRAM). This study investigates a state-of-the-art OxRRAM device by in-situ transmission electron microscopy (TEM). Combining high spatial resolution obtained with a very small probe scanned over the area of interest of the sample and chemical analyses with electron energy loss spectroscopy, the local chemical state of the device can be compared before and after applying an electrical bias. This in-situ approach allows simultaneous TEM observation and memory cell operation. After the in-situ forming, a filamentary migration of titanium within the dielectric hafnium dioxide layer has been evidenced. This migration may be at the origin of the conductive path responsible for the low and high resistive states of the memory.


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