Calculation of characteristics of embedded coupled microstrip lines with finite thickness

The existing CAD formulae for dielectric loss of microstrip lines on substrate are complicated and inaccurate at high frequencies. In particular, no closed-form expression has been obtained for the dielectric loss of microstrip lines on multi-layer dielectric substrate by including the conductor-substrate interphase effect, although attempts have been made to study the finite thickness effect of the conductor and dielectric substrate. The present work represents the first attempt to obtain a closed-form CAD formula for the dielectric loss of microstrip lines on dielectric substrates by considering the effect of conductor-substrate interphase. Our simple and accurate model systematically considers the effect of the interphase between the microstrip line and substrate by using a quasi-TEM approach and is shown to be supported by the available experimental data.

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Analytical methods for calculating the characteristic impedance of finite-thickness microstrip lines

International Journal of Electronics ◽

10.1080/00207217608920650 ◽

1976 ◽

Vol 41 (4) ◽

pp. 399-403 ◽

Cited By ~ 1

Author(s):

R. P. OWENS ◽

M. H. N. POTOK

Keyword(s):

Analytical Methods ◽

Characteristic Impedance ◽

Finite Thickness ◽

Microstrip Lines

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The restoration of blurred electron micrographs

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100142529 ◽

1986 ◽

Vol 44 ◽

pp. 180-181

Author(s):

Bridget Carragher ◽

David A. Bluemke ◽

Michael J. Potel ◽

Robert Josephs

Keyword(s):

Cross Section ◽

Electron Micrographs ◽

Relative Motion ◽

Finite Thickness ◽

Image Plane ◽

Helical Axis ◽

Thin Sections ◽

Structural Details

We have investigated the feasibility of restoring blurred electron micrographs. Two related problems have been considered; the restoration of images blurred as a result of relative motion between the specimen and the image plane, and the restoration of images which are rotationally blurred about an axis. Micrographs taken while the specimen is drifting result in images which are blurred in the direction of motion. An example of rotational blurring arises in micrographs of thin sections of helical particles viewed in cross section. The twist of the particle within the finite thickness of the section causes the image to appear rotationally blurred about the helical axis. As a result, structural details, particularly at large distances from the helical axis, will be obscured.

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