Optical constants of 2,3-bis-(N,N-1-naphthylphenylamino) -N-methylmaleimide thin film by spectroscopic ellipsometry

2005 ◽  
Vol 31 (3) ◽  
pp. 179-183
Author(s):  
W. Xie ◽  
C. Li ◽  
S. Liu
Keyword(s):  
Thin Film ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants

Ellipsometric study of the complex optical constants of a CsPbBr3 perovskite thin film

2018 ◽  
Vol 6 (39) ◽  
pp. 10450-10455 ◽  
Author(s):  
Minglin Zhao ◽  
Yujun Shi ◽  
Jun Dai ◽  
Jie Lian
Keyword(s):  
Thin Film ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Interband Transitions ◽  
Hybrid Perovskite ◽  
Ellipsometric Study

Complex optical constants and interband transitions of a hybrid perovskite CsPbBr3 thin film measured by spectroscopic ellipsometry.

Optical constants of DC magnetron sputtered titanium dioxide thin films measured by spectroscopic ellipsometry

2003 ◽  
Vol 38 (9) ◽  
pp. 773-778 ◽  
Author(s):  
B. Karunagaran ◽  
R. T. Rajendra Kumar ◽  
C. Viswanathan ◽  
D. Mangalaraj ◽  
Sa. K. Narayandass ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Titanium Dioxide Thin Films

scholarly journals Determination of the Thickness and Optical Constants of ZrO2 by Spectroscopic Ellipsometry and Spectrophotometric Method

2011 ◽  
Vol 8 ◽  
pp. 223-227 ◽  
Author(s):  
R. Yusoh ◽  
M. Horprathum ◽  
P. Eiamchai ◽  
S. Chanyawadee ◽  
K. Aiempanakit
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Spectrophotometric Method ◽  
Optical Constants

Detection of an ordered-structure fraction in amorphous silicon

2016 ◽  
Vol 49 (2) ◽  
pp. 528-532 ◽  
Author(s):  
Xiao-Dong Wang ◽  
Bo Chen ◽  
Hai-Feng Wang ◽  
Xin Zheng ◽  
Shi-Jie Liu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Amorphous Silicon ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Ordered Structure ◽  
Radio Frequency Magnetron Sputtering ◽  
Medium Range Order ◽  
Medium Range ◽  
Si Films

Amorphous silicon (a-Si) films were prepared by radio frequency magnetron sputtering. Spectroscopic ellipsometry (SE) was utilized to detect an ordered-structure fraction in a-Si. The SE analysis of a-Si films with different thicknesses (7.0–140.0 nm) demonstrates that no more than 2.81% of medium-range order exists in the samples, and interestingly, there is a thickness dependence of optical constants for a-Si in the range of 1.5–5.0 eV.

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