Existence of threshold density in silicon surface cleaning using hydrogen electron cyclotron resonance plasma

1991 ◽  
Vol 58 (23) ◽  
pp. 2663-2665 ◽  
Author(s):  
Kenji Nakashima ◽  
Masahiko Ishii ◽  
Ichiro Tajima ◽  
Minoru Yamamoto
Keyword(s):  
Cyclotron Resonance ◽  
Silicon Surface ◽  
Electron Cyclotron Resonance ◽  
Surface Cleaning ◽  
Electron Cyclotron ◽  
Threshold Density ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Damage Induced by Electron Cyclotron Resonance Plasma Etching on Silicon Surface

1991 ◽  
Vol 30 (Part 1, No. 5) ◽  
pp. 1045-1049 ◽  
Author(s):  
Gen Washidzu ◽  
Tohru Hara ◽  
Jun Hiyoshi ◽  
Masami Sasaki ◽  
Yasuhiro Suzuki ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Silicon Surface ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Surface cleaning of C‐dopedp+GaAs with hydrogen electron cyclotron resonance plasma

1993 ◽  
Vol 73 (12) ◽  
pp. 8146-8150 ◽  
Author(s):  
Noriyuki Watanabe ◽  
Takumi Nittono ◽  
Hiroshi Ito ◽  
Naoto Kondo ◽  
Yasushi Nanishi
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Surface Cleaning ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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