Stable hydrogenated amorphous silicon films deposited from silane and dichlorosilane by radio frequency plasma chemical vapor deposition
2007 ◽
Vol 154
(5)
◽
pp. G122
◽
2008 ◽
Vol 69
(2-3)
◽
pp. 648-652
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1994 ◽
Vol 33
(Part 1, No. 7B)
◽
pp. 4373-4376
◽
1993 ◽
pp. 345-350
◽
2012 ◽
Vol 51
(1)
◽
pp. 01AD03
◽