Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH$_{4}$+B$_{10}$H$_{14}$ Multi-Hollow Discharge Plasma Chemical Vapor Deposition

2012 ◽  
Vol 51 (1) ◽  
pp. 01AD03 ◽  
Author(s):  
Kazunori Koga ◽  
Kenta Nakahara ◽  
Yeon-Won Kim ◽  
Takeaki Matsunaga ◽  
Daisuke Yamashita ◽  
...  
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