Features of hydrogenated amorphous silicon films developed under an unexplored region of parameter space of radio-frequency plasma-enhanced chemical vapor deposition

2000 ◽  
Vol 76 (17) ◽  
pp. 2340-2342 ◽  
Author(s):  
Sukti Hazra ◽  
A. R. Middya ◽  
C. Longeaud ◽  
Swati Ray
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Amorphous Silicon ◽  
Parameter Space ◽  
Vapor Deposition ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Hydrogenated Amorphous

Hydrogenation-assisted nanocrystallization of amorphous silicon by radio-frequency plasma-enhanced chemical vapor deposition

2006 ◽  
Vol 100 (10) ◽  
pp. 104320 ◽  
Author(s):  
P. Hashemi ◽  
Y. Abdi ◽  
S. Mohajerzadeh ◽  
J. Derakhshandeh ◽  
A. Khajooeizadeh ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽  
2004 ◽  
Vol 42 (14) ◽  
pp. 2867-2872 ◽  
Author(s):  
Jianjun Wang ◽  
Mingyao Zhu ◽  
Ron A. Outlaw ◽  
Xin Zhao ◽  
Dennis M. Manos ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Carbon Nanosheets ◽  
Inductively Coupled ◽  
Frequency Plasma
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