Insights into the stability of silicon cluster ions: Reactive etching with O2
2002 ◽
Vol 117
(7)
◽
pp. 3219-3223
◽
1990 ◽
Vol 93
(8)
◽
pp. 5709-5718
◽
1999 ◽
Vol 17
(4)
◽
pp. 1531-1535
◽
1991 ◽
Vol 94
(4)
◽
pp. 2631-2639
◽
2005 ◽
Vol 19
(15n17)
◽
pp. 2502-2507
2005 ◽
Vol 71
(704)
◽
pp. 1148-1154
1987 ◽
Vol 86
(7)
◽
pp. 4245-4257
◽
1992 ◽
Vol 96
(12)
◽
pp. 9180-9190
◽
1989 ◽
Vol 91
(7)
◽
pp. 4420-4421
◽
Keyword(s):
1991 ◽
Vol 94
(4)
◽
pp. 2618-2630
◽