Effect of interfacial dislocations on ferroelectric phase stability and domain morphology in a thin film—a phase-field model

2003 ◽  
Vol 94 (4) ◽  
pp. 2542-2547 ◽  
Author(s):  
S. Y. Hu ◽  
Y. L. Li ◽  
L. Q. Chen
2020 ◽  
Vol 22 (12) ◽  
pp. 6638-6652 ◽  
Author(s):  
Olivier J. J. Ronsin ◽  
DongJu Jang ◽  
Hans-Joachim Egelhaaf ◽  
Christoph J. Brabec ◽  
Jens Harting

Simulation of the structure formation of an immiscible blend upon fast drying including roughness generation.


2014 ◽  
Vol 116 (11) ◽  
pp. 114313 ◽  
Author(s):  
M. Arjmand ◽  
J. Deng ◽  
N. Swaminathan ◽  
D. Morgan ◽  
I. Szlufarska

2011 ◽  
Vol 327 (1) ◽  
pp. 189-201 ◽  
Author(s):  
Frank Wendler ◽  
Christian Mennerich ◽  
Britta Nestler

2019 ◽  
Vol 944 ◽  
pp. 788-794
Author(s):  
Ping Ping Wu ◽  
Guan Wang ◽  
Shu Min Pang

Heteroepitaxially grown multilayered thin film structures have been attracted of great interest due to its potential applications in photovoltaic/light emitting/electronics devices. The thin film morphology plays an important role in enhancing its related physical properties. It is not easy to simulate the multi-layered thin film structures due to the influence of the interface/surface fluctuation. However, the phase field method, based on thermodynamics and Cahn-Hilliard diffusion model, can predict the thin film morphologies without tracking the interfaces. In this paper, a new phase field model was developed for predicting multi-layer structures with multi-order parameters. The morphologies with strain distributions of the quantum wells, quantum dots and buffer layers structures were investigated in the current study. We found that the strain distribution has a strong effect on the suface/interface morphologies in the multilayered structures. Some simulation results are consistent with experimental observations.


RSC Advances ◽  
2019 ◽  
Vol 9 (13) ◽  
pp. 7575-7586 ◽  
Author(s):  
Le Van Lich ◽  
Van-Hai Dinh

New phase field model to reveal switching mechanism of needle domain in compositionally graded ferroelectric thin film.


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