A phase-field model for the evaporation of thin film mixtures

Numerical simulations of foam structure formation and destruction process were demonstrated using a phase field model. Two types of additional terms to control the cell size were introduced to the conventional multi-phase field model; one is to maintain the initial cell size, and the other is to adjust the size of neighboring cells to be equalized to each other. As a result, different types of foam structures were obtained according to the introduced effect of the extra terms. Destruction process was also simulated under simple assumptions; instantaneous bursts of cell wall occur intermittently at random sites, and the cell coarsening is accelerated when a certain time has passed. The intended variation was successfully observed, and the effectiveness of the model was confirmed.

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Effects of confinements on morphology of InxGa1−xAs thin film grown on sub-micron patterned GaAs substrate: Elastoplastic phase field model

Journal of Applied Physics ◽

10.1063/1.4896074 ◽

2014 ◽

Vol 116 (11) ◽

pp. 114313 ◽

Cited By ~ 2

Author(s):

M. Arjmand ◽

J. Deng ◽

N. Swaminathan ◽

D. Morgan ◽

I. Szlufarska

Keyword(s):

Thin Film ◽

Phase Field ◽

Gaas Substrate ◽

Field Model ◽

Phase Field Model

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A phase-field model for polycrystalline thin film growth

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2011.04.044 ◽

2011 ◽

Vol 327 (1) ◽

pp. 189-201 ◽

Cited By ~ 17

Author(s):

Frank Wendler ◽

Christian Mennerich ◽

Britta Nestler

Keyword(s):

Thin Film ◽

Phase Field ◽

Field Model ◽

Film Growth ◽

Phase Field Model ◽

Thin Film Growth ◽

Polycrystalline Thin Film

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A phase-field model for computer simulation of lamellar structure formation in γ-TiAl

Acta Materialia ◽

10.1016/j.actamat.2005.09.016 ◽

2006 ◽

Vol 54 (2) ◽

pp. 453-463 ◽

Cited By ~ 10

Author(s):

I. Katzarov ◽

S. Malinov ◽

W. Sha

Keyword(s):

Computer Simulation ◽

Structure Formation ◽

Phase Field ◽

Lamellar Structure ◽

Field Model ◽

Phase Field Model

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A Phase-Field Model for Multilayered Heterostructure Morphology

Materials Science Forum ◽

10.4028/www.scientific.net/msf.944.788 ◽

2019 ◽

Vol 944 ◽

pp. 788-794

Author(s):

Ping Ping Wu ◽

Guan Wang ◽

Shu Min Pang

Keyword(s):

Thin Film ◽

Quantum Wells ◽

Phase Field ◽

Field Model ◽

Phase Field Model ◽

Field Method ◽

Buffer Layers ◽

Phase Field Method ◽

Multilayered Structures ◽

Interface Surface

Heteroepitaxially grown multilayered thin film structures have been attracted of great interest due to its potential applications in photovoltaic/light emitting/electronics devices. The thin film morphology plays an important role in enhancing its related physical properties. It is not easy to simulate the multi-layered thin film structures due to the influence of the interface/surface fluctuation. However, the phase field method, based on thermodynamics and Cahn-Hilliard diffusion model, can predict the thin film morphologies without tracking the interfaces. In this paper, a new phase field model was developed for predicting multi-layer structures with multi-order parameters. The morphologies with strain distributions of the quantum wells, quantum dots and buffer layers structures were investigated in the current study. We found that the strain distribution has a strong effect on the suface/interface morphologies in the multilayered structures. Some simulation results are consistent with experimental observations.

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