Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

2005 ◽  
Vol 97 (9) ◽  
pp. 099903 ◽  
Author(s):  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Mikko Ritala ◽  
Teet Uustare ◽  
Timo Sajavaara ◽  
...  
Keyword(s):  
Dielectric Properties ◽  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Deposition Parameters ◽  
Layer Deposition

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

2004 ◽  
Vol 96 (9) ◽  
pp. 5298-5307 ◽  
Author(s):  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Mikko Ritala ◽  
Teet Uustare ◽  
Timo Sajavaara ◽  
...  
Keyword(s):  
Dielectric Properties ◽  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Deposition Parameters ◽  
Layer Deposition

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

2002 ◽  
Vol 92 (10) ◽  
pp. 5698-5703 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Jonas Sundqvist ◽  
Jaan Aarik ◽  
Jun Lu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of thin hafnium oxide films using a carbon free precursor

2003 ◽  
Vol 93 (1) ◽  
pp. 712-718 ◽  
Author(s):  
J. F. Conley ◽  
Y. Ono ◽  
D. J. Tweet ◽  
W. Zhuang ◽  
R. Solanki
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Characterization of Ultra-Thin Hafnium Oxide Films Grown on Silicon by Atomic Layer Deposition Using Tetrakis(ethylmethyl-amino) Hafnium and Water Precursors

2007 ◽  
Vol 19 (13) ◽  
pp. 3127-3138 ◽  
Author(s):  
Y. Wang ◽  
M.-T. Ho ◽  
L. V. Goncharova ◽  
L. S. Wielunski ◽  
S. Rivillon-Amy ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature

2005 ◽  
Vol 479 (1-2) ◽  
pp. 1-11 ◽  
Author(s):  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Teet Uustare ◽  
Jun Lu ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Deposition Temperature ◽  
Oxide Films ◽  
Atomic Layer ◽  
Structure And Properties ◽  
Engineering Structure ◽  
Layer Deposition

Atomic layer deposition of calcium oxide and calcium hafnium oxide films using calcium cyclopentadienyl precursor

2006 ◽  
Vol 500 (1-2) ◽  
pp. 322-329 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Timo Hänninen ◽  
Markku Leskelä
Keyword(s):  
Atomic Layer Deposition ◽  
Calcium Oxide ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Composition–Structure–Dielectric Property of Yttrium-Doped Hafnium Oxide Films Deposited by Atomic Layer Deposition

2009 ◽  
Vol 12 (9) ◽  
pp. G50 ◽  
Author(s):  
Qian Tao ◽  
Gregory Jursich ◽  
Prodyut Majumder ◽  
Manish Singh ◽  
Weronika Walkosz ◽  
...  
Keyword(s):  
Dielectric Property ◽  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Composition Structure

Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films

2005 ◽  
Vol 86 (7) ◽  
pp. 073116 ◽  
Author(s):  
Riikka L. Puurunen ◽  
Annelies Delabie ◽  
Sven Van Elshocht ◽  
Matty Caymax ◽  
Martin L. Green ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Gate Dielectric ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

2002 ◽  
Vol 416 (1-2) ◽  
pp. 72-79 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Juhani Keinonen ◽  
Markku Leskelä
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition
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