Magnetic field effects on secondary electron emission during ion implantation in a nitrogen plasma

Journal of Applied Physics ◽

10.1063/1.2201695 ◽

2006 ◽

Vol 100 (3) ◽

pp. 033303 ◽

Author(s):

Ing Hwie Tan ◽

Mario Ueda ◽

Renato S. Dallaqua ◽

Rogerio de Moraes Oliveira ◽

José O. Rossi

Keyword(s):

Magnetic Field ◽

Ion Implantation ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Nitrogen Plasma ◽

Magnetic Field Effects ◽

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Magnetic Field Effects on Secondary Electron Emission in Hall Thrusters

44th AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit ◽

10.2514/6.2008-4725 ◽

2008 ◽

Author(s):

Robert Santos ◽

Eduardo Ahedo

Keyword(s):

Magnetic Field ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Hall Thrusters ◽

Magnetic Field Effects ◽

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Simulation of Secondary Electron Emission from Solid Surface Irradiated by Plasmas in an Oblique Magnetic Field

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l1567 ◽

1995 ◽

Vol 34 (Part 2, No. 11B) ◽

pp. L1567-L1570

Author(s):

Kaoru Ohya ◽

Kazuyuki Hiroi ◽

Jun Kawata

Keyword(s):

Magnetic Field ◽

Solid Surface ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Oblique Magnetic Field

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Measurement of Secondary Electron Emission Coefficient of Plane Target in Plasma Immersion Ion Implantation

IEEJ Transactions on Fundamentals and Materials ◽

10.1541/ieejfms.124.223 ◽

2004 ◽

Vol 124 (3) ◽

pp. 223-228

Author(s):

Keiji Nakamura ◽

Masaki Ando ◽

Hideo Sugai

Keyword(s):

Ion Implantation ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Emission Coefficient ◽

Secondary Electron Emission Coefficient ◽

Plasma Immersion Ion Implantation

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Suppression of secondary electron emission from the material surfaces with grazing incident magnetic field in the plasma

Physics of Plasmas ◽

10.1063/1.871962 ◽

1996 ◽

Vol 3 (12) ◽

pp. 4310-4312 ◽

Author(s):

S. Takamura ◽

S. Mizoshita ◽

N. Ohno

Keyword(s):

Magnetic Field ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Material Surfaces

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In situ process monitoring in plasma immersion ion implantation based on measurements of secondary electron emission coefficient

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00127-5 ◽

2002 ◽

Vol 156 (1-3) ◽

pp. 83-86 ◽

Author(s):

Keiji Nakamura ◽

Mitsuaki Tanaka ◽

Hideo Sugai

Keyword(s):

Ion Implantation ◽

Process Monitoring ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Emission Coefficient ◽

Secondary Electron Emission Coefficient ◽

Plasma Immersion Ion Implantation

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Influence of the oblique magnetic field on the secondary electron emission from the plasma facing materials in fusion reactor

Journal of Physics Conference Series ◽

10.1088/1742-6596/516/1/012025 ◽

2014 ◽

Vol 516 ◽

pp. 012025 ◽

Author(s):

I E Berezina ◽

I V Tsvetkov

Keyword(s):

Magnetic Field ◽

Electron Emission ◽

Secondary Electron ◽

Fusion Reactor ◽

Secondary Electron Emission ◽

Plasma Facing Materials ◽

Oblique Magnetic Field

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Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates

Chinese Physics Letters ◽

10.1088/0256-307x/21/2/042 ◽

2004 ◽

Vol 21 (2) ◽

pp. 364-366 ◽

Author(s):

Li Xue-Chun ◽

Wang You-Nian

Keyword(s):

Ion Implantation ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Dielectric Substrates ◽

Plasma Immersion Ion Implantation

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Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2006.09.054 ◽

2007 ◽

Vol 201 (15) ◽

pp. 6597-6600 ◽

Author(s):

M. Ueda ◽

I.H. Tan ◽

R.S. Dallaqua ◽

J.O. Rossi

Keyword(s):

Magnetic Field ◽

Ion Implantation ◽

Secondary Electron ◽

Nitrogen Plasma ◽

Dc Magnetic Field

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Self-magnetic field effects on electron emission in planar diodes as the critical current is approached

PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference. Digest of Papers (Cat. No.01CH37251) ◽

10.1109/ppps.2001.1001794 ◽

2002 ◽

Author(s):

P.F. Ottinger ◽

G. Cooperstein ◽

L. Schumer ◽

S.B. Swanekamp

Keyword(s):

Magnetic Field ◽

Critical Current ◽

Electron Emission ◽

Magnetic Field Effects ◽

Field Effects ◽

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Photon-enhanced secondary electron emission at target in plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/s0168-583x(03)00852-8 ◽

2003 ◽

Vol 206 ◽

pp. 798-802 ◽

Author(s):

Keiji Nakamura ◽

Masaki Ando ◽

Hideo Sugai

Keyword(s):

Ion Implantation ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Plasma Immersion Ion Implantation

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