The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2003 ◽
Vol 7
(3)
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pp. 357-366
2000 ◽
Vol 8
(2)
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pp. 277-286
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Keyword(s):
2010 ◽
Vol 43
(50)
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pp. 505203
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Keyword(s):
2004 ◽
Vol 54
(S3)
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pp. C877-C882
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