Transmission electron microscope study of ion beam annealing effects of ion‐implanted and evaporated amorphous silicon

1981 ◽  
Vol 52 (5) ◽  
pp. 3304-3309 ◽  
Author(s):  
L. J. Chen ◽  
Y. J. Wu ◽  
Y. C. Yang ◽  
K. P. Hsieh ◽  
M. S. Lin ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Amorphous Silicon ◽  
Transmission Electron Microscope ◽  
Microscope Study ◽  
Electron Microscope Study ◽  
Ion Beam ◽  
Transmission Electron ◽  
Annealing Effects ◽  
Transmission Electron Microscope Study ◽  
Ion Implanted
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