Raman scattering characterization of the microscopic structure of semi‐insulating polycrystalline Si thin films

1988 ◽  
Vol 63 (8) ◽  
pp. 2669-2673 ◽  
Author(s):  
D. J. Olego ◽  
H. Baumgart
2003 ◽  
Vol 6 (5-6) ◽  
pp. 547-550 ◽  
Author(s):  
B. Karunagaran ◽  
R.T. Rajendra Kumar ◽  
V. Senthil Kumar ◽  
D. Mangalaraj ◽  
Sa.K. Narayandass ◽  
...  

Nanoscale ◽  
2016 ◽  
Vol 8 (14) ◽  
pp. 7672-7682 ◽  
Author(s):  
R. Srikantharajah ◽  
K. Gerstner ◽  
S. Romeis ◽  
W. Peukert

1989 ◽  
Vol 168 ◽  
Author(s):  
J. C. Parker ◽  
H. L. M. Chang ◽  
J. J. Xu ◽  
D. J. Lam

AbstractCharacterization of TiO2 films grown by the MOCVD technique was carried out using micro-Raman scattering. The effects of processing parameters on the film composition and morphology were investigated. The micro-Raman technique was shown to be a useful tool for characterizing oxide thin films grown by the MOCVD technique.


2009 ◽  
Vol 517 (7) ◽  
pp. 2519-2523 ◽  
Author(s):  
P.A. Fernandes ◽  
P.M.P. Salomé ◽  
A.F. da Cunha
Keyword(s):  

2005 ◽  
Vol 418 (1-2) ◽  
pp. 28-34 ◽  
Author(s):  
Seongsik Hong ◽  
Hyunchul Jo ◽  
Hyeonsik Cheong ◽  
Gwangseo Park

2013 ◽  
Vol 542 ◽  
pp. 388-392 ◽  
Author(s):  
Young-Joo Lee ◽  
Jung-Dae Kwon ◽  
Dong-Ho Kim ◽  
Kee-Seok Nam ◽  
Yongsoo Jeong ◽  
...  

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