Reflection high‐energy electron‐diffraction study of metalorganic molecular‐beam epitaxy of GaAs using trimethylgallium and arsenic

1990 ◽  
Vol 67 (9) ◽  
pp. 4393-4395 ◽  
Author(s):  
B. W. Liang ◽  
T. P. Chin ◽  
C. W. Tu
Sign in / Sign up

Export Citation Format

Share Document