Effect of radio‐frequency power and substrate temperature on properties of hot‐plasma‐box glow‐discharge‐deposited hydrogenated amorphous silicon carbon alloys

1993 ◽  
Vol 73 (4) ◽  
pp. 1743-1749 ◽  
Author(s):  
D. M. Bhusari ◽  
S. T. Kshirsagar
Keyword(s):  
Glow Discharge ◽  
Substrate Temperature ◽  
Radio Frequency ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Radio Frequency Power ◽  
Silicon Carbon ◽  
Hot Plasma ◽  
Hydrogenated Amorphous ◽  
Frequency Power

Hot plasma box glow discharge reactor for production of uniform films of hydrogenated amorphous silicon alloys

1991 ◽  
Vol 197 (1-2) ◽  
pp. 215-224 ◽  
Author(s):  
D.M. Bhusari ◽  
L. Kale ◽  
A. Kumbhar ◽  
S. Sabane ◽  
S.T. Kshirsagar
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Alloys ◽  
Hot Plasma ◽  
Hydrogenated Amorphous

Evidence for graphitic‐type bonding in glow discharge hydrogenated amorphous silicon carbon alloys

1985 ◽  
Vol 57 (8) ◽  
pp. 2717-2720 ◽  
Author(s):  
A. H. Mahan ◽  
B. von Roedern ◽  
D. L. Williamson ◽  
A. Madan
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous

Growth and properties of glow-discharge hydrogenated amorphous silicon-carbon alloys from silane-propane mixtures

1988 ◽  
Vol 164 ◽  
pp. 221-226 ◽  
Author(s):  
A. Qayyum ◽  
J.I.B. Wilson ◽  
K. Ibrahim ◽  
S.K. Al-Sabbagh ◽  
U. Eicker
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous
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