A generalized view of the correlation factor in solid‐state diffusion

1994 ◽  
Vol 75 (6) ◽  
pp. 2851-2856 ◽  
Author(s):  
Sheikh A. Akbar
1975 ◽  
Vol 53 (11) ◽  
pp. 1054-1059 ◽  
Author(s):  
G. V. Kidson

Hart's discussion of the measured diffusion coefficient D, for systems in which atom transport occurs via both the vacancy mechanism and along dislocation pipes, has been generalized to include any number of contributing mechanisms. The treatment introduces the concept of uncorrelated segments and shows that the correlation factor associated with each contributing mechanism contains a time independent parameter [Formula: see text] associated with the average number of jumps per segment. The analysis shows that the usual expression for the correlation factors obtained by assuming [Formula: see text] can be corrected for finite values of [Formula: see text]. The error involved in a typical case is less than 1% if [Formula: see text].


2002 ◽  
Vol 17 (1) ◽  
pp. 52-59 ◽  
Author(s):  
N.F. Gao ◽  
Y. Miyamoto

The joining of a Ti3SiC2 ceramic with a Ti–6Al–4V alloy was carried out at the temperature range of 1200–1400 °C for 15 min to 4 h in a vacuum. The total diffusion path of joining was determined to be Ti3SiC2/Ti5Si3Cx/Ti5Si3Cx + TiCx/TiCx/Ti. The reaction was rate controlled by the solid-state diffusion below 1350 °C and turned to the liquid-state diffusion controlled with a dramatic increase of parabolic rate constant Kp when the temperature exceeded 1350 °C. The TiCx tended to grow at the boundarywith the Ti–6Al–4V alloy at a higher temperature and longer holding time. TheTi3SiC2/Ti–6Al–4V joint is expected to be applied to implant materials.


2016 ◽  
Vol 686 ◽  
pp. 794-802 ◽  
Author(s):  
Yuan Yuan ◽  
Dajian Li ◽  
Yuanyuan Guan ◽  
Hans J. Seifert ◽  
Nele Moelans

Sign in / Sign up

Export Citation Format

Share Document