Copper nitride thin films prepared by radio‐frequency reactive sputtering
1995 ◽
Vol 78
(6)
◽
pp. 4104-4107
◽
Toshiro Maruyama
◽
Tomonori Morishita
2011 ◽
Vol 519
(18)
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pp. 5949-5954
◽
C. Platzer-Björkman
◽
T. Mongstad
◽
J.P. Mæhlen
◽
A. Baldi
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S. Karazhanov
◽
...
1995 ◽
Vol 77
(12)
◽
pp. 6641-6645
◽
Toshiro Maruyama
◽
Tomonori Morishita
2017 ◽
Vol 634
◽
pp. 175-180
◽
Cheol Kim
◽
Sungdong Kim
◽
Sarah Eunkyung Kim
2015 ◽
Vol 594
◽
pp. 35-39
◽
1987 ◽
Vol 5
(4)
◽
pp. 1783-1785
◽
2003 ◽
Vol 83
(9)
◽
pp. 1743-1745
◽
Y. B. He
◽
W. Kriegseis
◽
B. K. Meyer
◽
A. Polity
◽
M. Serafin
1993 ◽
Vol 88
(10)
◽
pp. 803-806
◽
Sunil Kumar
◽
T.L. Tansley
2018 ◽
Vol 660
◽
pp. 899-906
◽
Zih-Chen Hong
◽
Hsiang-Chun Hsueh
◽
Chong-Zan Wu
◽
Sham-Tsong Shiue
2008 ◽
Vol 454
(1-2)
◽
pp. 102-105
◽
1992 ◽
Vol 10
(3)
◽
pp. 462-467
◽
F. C. Stedile
◽
I. J. R. Baumvol
◽
W. H. Schreiner
◽
F. L. Freire