Laser ablation for the metal-oxide thin-film deposition: Mechanisms and applications

Complexes [M(O2CCH2OC2H4OMe)2] (M = Co, Mn) were synthesized characterised regarding their thermal behaviour. They were used as precursors for deposition of rough Co3O4and smooth Mn2O3/Mn3O4thin filmsviathe CCVD process.

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Solution-processed metal oxide arrays using femtosecond laser ablation and annealing for thin-film transistors

Journal of Materials Chemistry C ◽

10.1039/c7tc01953j ◽

2017 ◽

Vol 5 (36) ◽

pp. 9273-9280 ◽

Cited By ~ 16

Author(s):

Cihai Chen ◽

Gengxu Chen ◽

Huihuang Yang ◽

Guocheng Zhang ◽

Daobin Hu ◽

...

Keyword(s):

Thin Film ◽

Laser Ablation ◽

Femtosecond Laser ◽

Metal Oxide ◽

Thin Film Transistors ◽

Thin Film Transistor ◽

Femtosecond Laser Ablation ◽

Oxide Thin Film ◽

Metal Oxide Layer ◽

Metal Oxide Thin Film

A femtosecond laser is proposed to pattern and anneal a metal oxide layer for simple fabrication of metal oxide thin-film transistor arrays.

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Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation

Applied Surface Science ◽

10.1016/j.apsusc.2005.07.102 ◽

2006 ◽

Vol 252 (13) ◽

pp. 4637-4641 ◽

Cited By ~ 9

Author(s):

B. Mitu ◽

V. Marotta ◽

S. Orlando

Keyword(s):

Thin Film ◽

Laser Ablation ◽

Metal Oxide ◽

Gas Sensors ◽

Oxide Thin Film ◽

Rf Plasma ◽

Metal Oxide Thin Film

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Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100089652 ◽

1991 ◽

Vol 49 ◽

pp. 1068-1069

Author(s):

M. Grant Norton ◽

C. Barry Carter

Keyword(s):

Thin Film ◽

Thin Films ◽

Laser Ablation ◽

Substrate Surface ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Thin Film Deposition ◽

Film Deposition ◽

Laser Ablation Process ◽

Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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