scholarly journals Cobalt and manganese carboxylates for metal oxide thin film deposition by applying the atmospheric pressure combustion chemical vapour deposition process

RSC Advances ◽  
2018 ◽  
Vol 8 (28) ◽  
pp. 15632-15640 ◽  
Author(s):  
B. S. M. Kretzschmar ◽  
K. Assim ◽  
A. Preuß ◽  
A. Heft ◽  
M. Korb ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

Complexes [M(O2CCH2OC2H4OMe)2] (M = Co, Mn) were synthesized characterised regarding their thermal behaviour. They were used as precursors for deposition of rough Co3O4and smooth Mn2O3/Mn3O4thin filmsviathe CCVD process.

scholarly journals Thin film Deposition Methods: A Critical Review

2021 ◽  
Vol 9 (VI) ◽  
pp. 5215-5232
Author(s):  
Mandakini N. Chaudhari
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Vapour Deposition ◽  
Research Work ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Specific Method ◽  
Important Method ◽  
Advantages And Disadvantages

The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.

Technology of metal oxide thin film deposition with interruptions

2007 ◽  
Vol 202 (3) ◽  
pp. 453-459 ◽  
Author(s):  
V. Khatko ◽  
J. Calderer ◽  
S. Vallejos ◽  
E. Llobet ◽  
X. Correig
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

scholarly journals Preparation and Characterization of Self-Assembled Manganese Dioxide Thin Films

2011 ◽  
Vol 2011 ◽  
pp. 1-7 ◽  
Author(s):  
Suh Cem Pang ◽  
Suk Fun Chin ◽  
Chian Ye Ling
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Manganese Dioxide ◽  
Self Assembly ◽  
Electrode Materials ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Deposition Duration ◽  
Self Assembled

Thin films of manganese dioxide (MnO2) were prepared by self-assembly of MnO2nanoparticles directly unto nickel-coated poly(ethylene terephthalate) flexible films using the newly developed horizontal submersion process. The thickness of deposited thin films was controllable by the deposition duration. This horizontal submersion deposition process for thin-film deposition is relatively easy, simple, and cost effective. Effects of deposition duration and calcination temperatures on the microstructure and electrochemical properties of self-assembled MnO2thin films were investigated. Optimized MnO2thin films exhibited high charge capacity, good cycling reversibility, and stability in a mild aqueous electrolyte and are thus promising electrode materials for the fabrication of thin-film electrochemical capacitors.

scholarly journals Editorial for the Special Issue on ‘Metal Oxide Thin Film: Synthesis, Characterization, and Application’

Materials ◽  
2021 ◽  
Vol 14 (8) ◽  
pp. 1834
Author(s):  
Erwan Rauwel ◽  
Protima Rauwel
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
New Technologies ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Special Issue ◽  
Metal Oxide Thin Film ◽  
Film Synthesis

The last two decades have witnessed the development of new technologies for thin-film deposition and coating [...]

scholarly journals Optical investigations of microwave induced synthesis of zinc oxide thin-film

2018 ◽  
Vol 36 (2) ◽  
pp. 304-309 ◽  
Author(s):  
Akhalakur Rahman Ansari ◽  
Shahir Hussain ◽  
Mohd. Imran ◽  
Attieh A. Al-Ghamdi ◽  
Mohammed Rehaan Chandan
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Average Diameter ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
X Ray Diffraction ◽  
Zinc Oxide Thin Film ◽  
Zno Nanocrystals ◽  
Vis Spectroscopy

Abstract In this article, ZnO thin-film deposition on a glass substrate was done using microwave induced oxygen plasma based CVD system. The prepared thin-films were tested in terms of crystallinity and optical properties by varying the microwave power. The effect of power variation on the morphology and size of final products was carefully investigated. The crystal structure, chemical composition and morphology of the final products were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-Vis spectroscopy, Raman spectroscopy and photoluminescence (PL). This technique confirmed the presence of hexagonal ZnO nanocrystals in all the thin-films. The minimum crystallite grain size as obtained from the XRD measurements was ~9.7 nm and the average diameter was ~18 nm.

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