Three dimensional effects on proton acceleration by intense laser solid target interaction

AbstractRecent advances in the production of high repetition, high power, and short laser pulse have enabled the generation of high-energy proton beam, required for technology and other medical applications. Here we demonstrate the effective laser driven proton acceleration from near-critical density hydrogen plasma by employing the short and intense laser pulse through three-dimensional (3D) particle-in-cell (PIC) simulation. The generation of strong magnetic field is demonstrated by numerical results and scaled with the plasma density and the electric field of laser. 3D PIC simulation results show the ring shaped proton density distribution where the protons are accelerated along the laser axis with fairly low divergence accompanied by off-axis beam of ring-like shape.

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Flow predictions for MHD channels with an approximation for three-dimensional effects

10.2514/6.1978-1172 ◽

1978 ◽

Author(s):

F. BLOTTNER

Keyword(s):

Three Dimensional ◽

Dimensional Effects

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Three Dimensional Effects in Fiber Reinforced Composites Under Compression.

10.21236/ada292027 ◽

1995 ◽

Cited By ~ 2

Author(s):

S. Xu ◽

Y. J. Weitsman

Keyword(s):

Three Dimensional ◽

Fiber Reinforced Composites ◽

Reinforced Composites ◽

Fiber Reinforced ◽

Dimensional Effects

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High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽

10.1515/nanoph-2021-0263 ◽

2021 ◽

Vol 0 (0) ◽

Author(s):

Elmina Kabouraki ◽

Vasileia Melissinaki ◽

Amit Yadav ◽

Andrius Melninkaitis ◽

Konstantina Tourlouki ◽

...

Keyword(s):

Nanoimprint Lithography ◽

Three Dimensional ◽

Damage Threshold ◽

Laser Pulses ◽

Intense Laser ◽

Optical Elements ◽

Photonic Circuits ◽

Future Production ◽

Intense Laser Pulses ◽

Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

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