Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride

2017 ◽  
Vol 146 (5) ◽  
pp. 052819 ◽  
Author(s):  
Jaime W. DuMont ◽  
Steven M. George
2015 ◽  
Vol 119 (25) ◽  
pp. 14185-14194 ◽  
Author(s):  
Younghee Lee ◽  
Jaime W. DuMont ◽  
Andrew S. Cavanagh ◽  
Steven M. George

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