Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride
2017 ◽
Vol 146
(5)
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pp. 052819
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2020 ◽
Vol 38
(2)
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pp. 022602
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2015 ◽
Vol 119
(25)
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pp. 14185-14194
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2019 ◽
Vol 31
(13)
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pp. 4793-4804
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2021 ◽
Vol 39
(3)
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pp. 030402
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