Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
2021 ◽
Vol 39
(3)
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pp. 030402
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2019 ◽
Vol 31
(13)
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pp. 4793-4804
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2021 ◽
Vol 39
(3)
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pp. 032416
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2020 ◽
Vol 38
(2)
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pp. 022602
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2011 ◽
Vol 158
(1)
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pp. D1
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2019 ◽
Vol 123
(14)
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pp. 8770-8776
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