Advances in Patterning Materials and Processes XXXVII
Latest Publications

TOTAL DOCUMENTS

56

(FIVE YEARS 56)

H-INDEX

1

(FIVE YEARS 1)

Published By SPIE

9781510634190, 9781510634206

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Front Matter: Volume 11326

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2571086 ◽

2020 ◽

Keyword(s):

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Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2552003 ◽

2020 ◽

Author(s):

Guido Rademaker ◽

Aurélie Le Pennec ◽

Tommaso Giammaria ◽

Khatia Benotmane ◽

Hanh Pham ◽

...

Keyword(s):

Image Transfer ◽

Immersion Lithography ◽

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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2552166 ◽

2020 ◽

Author(s):

Seiji Nagahara ◽

Cong Que Dinh ◽

Keisuke Yoshida ◽

Gosuke Shiraishi ◽

Yoshihiro Kondo ◽

...

Keyword(s):

Process Control ◽

Chemical Gradient ◽

Resolution Process ◽

Flood Exposure ◽

Gradient Enhancement

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All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2552189 ◽

2020 ◽

Author(s):

Satinder Sharma ◽

Rudra Kumar ◽

Manvendra Chauhan ◽

Mohamad G. Moinuddin ◽

Jerome Peter ◽

...

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Block copolymer line roughness measurements via PSD: application to fingerprint samples

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2551854 ◽

2020 ◽

Author(s):

Aurélie Le Pennec ◽

Jérôme Rêche ◽

Patrick Quéméré ◽

Guido Rademaker ◽

Romain Jarnias ◽

...

Keyword(s):

Block Copolymer ◽

Roughness Measurements

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Algebraic model for extremely unlikely resist dissolution events

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2553048 ◽

2020 ◽

Author(s):

Andrew R. Neureuther ◽

Luke Long ◽

Patrick Naulleau

Keyword(s):

Algebraic Model

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Deposition-based patterning by area-selective deposition: Dielectric-on-dielectric and metal-on-metal using integrated Atomic Layer Deposition and thermally-driven Atomic Layer Etching (Conference Presentation)

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2553961 ◽

2020 ◽

Author(s):

Gregory N. Parsons

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Selective Deposition ◽

Layer Deposition ◽

Metal On Metal ◽

Thermally Driven ◽

Atomic Layer Etching

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Enhancing the reactivity of polymerizable antimony carboxylate EUV photoresists (Conference Presentation)

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2553529 ◽

2020 ◽

Author(s):

Michael Murphy ◽

James Passarelli ◽

Maximilian Weires ◽

Jodi Grzeskowiak ◽

Robert L. Brainard

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Inhibitor design for area selective atomic layer deposition (Conference Presentation)

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2551982 ◽

2020 ◽

Author(s):

Rudy J. Wojtecki

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Inhibitor Design ◽

Layer Deposition

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Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

Advances in Patterning Materials and Processes XXXVII ◽

10.1117/12.2551694 ◽

2020 ◽

Author(s):

Charlotte A. Cutler ◽

Dan Millward ◽

Choong-Bong Lee ◽

James W. Thackeray ◽

John Nelson ◽

...

Keyword(s):

Spectral Density ◽

Power Spectral Density ◽

Power Spectral ◽

Reduction Strategies ◽

Density Analysis ◽

Power Spectral Density Analysis

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