Advances in Patterning Materials and Processes XXXVII
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56
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Published By SPIE

9781510634190, 9781510634206
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

2020 ◽  
Author(s):  
Guido Rademaker ◽  
Aurélie Le Pennec ◽  
Tommaso Giammaria ◽  
Khatia Benotmane ◽  
Hanh Pham ◽  
...  
Keyword(s):  
Image Transfer ◽  
Immersion Lithography ◽  
193 Nm

All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

2020 ◽  
Author(s):  
Satinder Sharma ◽  
Rudra Kumar ◽  
Manvendra Chauhan ◽  
Mohamad G. Moinuddin ◽  
Jerome Peter ◽  
...  
Keyword(s):  
Metal Core

Block copolymer line roughness measurements via PSD: application to fingerprint samples

2020 ◽  
Author(s):  
Aurélie Le Pennec ◽  
Jérôme Rêche ◽  
Patrick Quéméré ◽  
Guido Rademaker ◽  
Romain Jarnias ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Roughness Measurements

Algebraic model for extremely unlikely resist dissolution events

2020 ◽  
Author(s):  
Andrew R. Neureuther ◽  
Luke Long ◽  
Patrick Naulleau
Keyword(s):  
Algebraic Model

Enhancing the reactivity of polymerizable antimony carboxylate EUV photoresists (Conference Presentation)

2020 ◽  
Author(s):  
Michael Murphy ◽  
James Passarelli ◽  
Maximilian Weires ◽  
Jodi Grzeskowiak ◽  
Robert L. Brainard

Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

2020 ◽  
Author(s):  
Charlotte A. Cutler ◽  
Dan Millward ◽  
Choong-Bong Lee ◽  
James W. Thackeray ◽  
John Nelson ◽  
...  
Keyword(s):  
Spectral Density ◽  
Power Spectral Density ◽  
Line Width ◽  
Power Spectral ◽  
Reduction Strategies ◽  
Density Analysis ◽  
Power Spectral Density Analysis
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