Comparison of atomic layer deposited Al2O3 and (Ta2O5)0.12(Al2O3)0.88 gate dielectrics on the characteristics of GaN-capped AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors
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Vol 126
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pp. 034102
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T. Partida-Manzanera
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Z. H. Zaidi
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J. W. Roberts
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S. B. Dolmanan
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Ondrej Pohorelec
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