Advanced techniques for quantum-state specific reaction dynamics of gas phase metal atoms

The condensed-phase excited-state reaction dynamics of chlorine dioxide are investigated using resonance Raman intensity analysis. Absolute Raman intensities are measured on resonance with the 2B2–2A2 electronic transition and used to establish the excited-state structural evolution which occurs on the 2A2 surface following photoexcitation. Analysis of the intensities demonstrates that excited-state relaxation occurs along all three normal coordinates; however, only modest evolution is observed along the asymmetric stretch. This limited relaxation stands in contrast to the extensive motion along this coordinate in the gas phase. It is proposed that the initial excited-state structural relaxation serves to define the symmetry of the reaction coordinate and thus the mechanism of Cl production following photolysis of OClO.

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Laserspectroscopic Studies of Bimolecular Elementary Reaction Dynamics in the Gas Phase

Gas Phase Chemical Reaction Systems - Springer Series in Chemical Physics ◽

10.1007/978-3-642-80299-7_2 ◽

1996 ◽

pp. 14-31

Author(s):

H.-R. Volpp ◽

J. Wolfrum

Keyword(s):

Gas Phase ◽

Reaction Dynamics ◽

Elementary Reaction

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Empirical Valence Bond Methods for Exploring Reaction Dynamics in the Gas Phase and in Solution

Theory and Applications of the Empirical Valence Bond Approach ◽

10.1002/9781119245544.ch4 ◽

2017 ◽

pp. 93-119

Author(s):

Jeremy N. Harvey ◽

Michael O'Connor ◽

David R. Glowacki

Keyword(s):

Gas Phase ◽

Valence Bond ◽

Reaction Dynamics ◽

Empirical Valence Bond

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ChemInform Abstract: Kinetics of Neutral Transition-Metal Atoms in the Gas Phase: Oxidation Reactions of Ti(a3F) from 300 to 600 K.

ChemInform ◽

10.1002/chin.199345024 ◽

2010 ◽

Vol 24 (45) ◽

pp. no-no

Author(s):

M. L. CAMPBELL ◽

R. E. MCCLEAN

Keyword(s):

Transition Metal ◽

Gas Phase ◽

Oxidation Reactions ◽

Metal Atoms ◽

Transition Metal Atoms ◽

Phase Oxidation ◽

Gas Phase Oxidation ◽

Kinetics Of

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Mechanism of Chromium Deposition from Cr(CO)6 by Uv Laser Light

MRS Proceedings ◽

10.1557/proc-158-27 ◽

1989 ◽

Vol 158 ◽

Cited By ~ 1

Author(s):

R. Nowak ◽

P. Hess

Keyword(s):

Gas Phase ◽

Metal Film ◽

Film Growth ◽

Laser Light ◽

Film Deposition ◽

Uv Laser ◽

Impurity Incorporation ◽

Metal Atoms ◽

Chromium Films ◽

Main Growth

ABSTRACTThe mechanism of metal film deposition from carbonyls as precursors is discussed in detail. It is shown that different species produced by UV laser irradiation in the gas phase contribute to film growth. Highly reactive species such as metal atoms may be important during the nucleation phase, whereas more stable carbonyls are responsible for the main growth process. This indicates that the main decarbonylation effect occurs at the surface. The higher level of impurity incorporation in chromium films in comparison with nickel films is explained by the relative position of the Fermi level in the d-band of Ni and Cr with respect to the 2π* level of CO, which favors CO bond dissociation in the case of chromium.

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