scholarly journals Anomalous Hall effect and negative longitudinal magnetoresistance in half-Heusler topological semimetal candidates TbPtBi and HoPtBi

APL Materials ◽  
2020 ◽  
Vol 8 (11) ◽  
pp. 111107
Author(s):  
O. Pavlosiuk ◽  
P. Fałat ◽  
D. Kaczorowski ◽  
P. Wiśniewski
2019 ◽  
Vol 115 (25) ◽  
pp. 252401 ◽  
Author(s):  
Qiang Wang ◽  
Zhenchao Wen ◽  
Takahide Kubota ◽  
Takeshi Seki ◽  
Koki Takanashi

2020 ◽  
Vol 11 (1) ◽  
Author(s):  
Peigang Li ◽  
Jahyun Koo ◽  
Wei Ning ◽  
Jinguo Li ◽  
Leixin Miao ◽  
...  

An amendment to this paper has been published and can be accessed via a link at the top of the paper.


2019 ◽  
Vol 100 (5) ◽  
Author(s):  
Anastasios Markou ◽  
Dominik Kriegner ◽  
Jacob Gayles ◽  
Liguo Zhang ◽  
Yi-Cheng Chen ◽  
...  

2020 ◽  
Vol 101 (12) ◽  
Author(s):  
Huibin Zhou ◽  
Guoqing Chang ◽  
Guangqiang Wang ◽  
Xin Gui ◽  
Xitong Xu ◽  
...  

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Fei Wang ◽  
Xuepeng Wang ◽  
Yi-Fan Zhao ◽  
Di Xiao ◽  
Ling-Jie Zhou ◽  
...  

AbstractThe Berry phase picture provides important insights into the electronic properties of condensed matter systems. The intrinsic anomalous Hall (AH) effect can be understood as the consequence of non-zero Berry curvature in momentum space. Here, we fabricate TI/magnetic TI heterostructures and find that the sign of the AH effect in the magnetic TI layer can be changed from being positive to negative with increasing the thickness of the top TI layer. Our first-principles calculations show that the built-in electric fields at the TI/magnetic TI interface influence the band structure of the magnetic TI layer, and thus lead to a reconstruction of the Berry curvature in the heterostructure samples. Based on the interface-induced AH effect with a negative sign in TI/V-doped TI bilayer structures, we create an artificial “topological Hall effect”-like feature in the Hall trace of the V-doped TI/TI/Cr-doped TI sandwich heterostructures. Our study provides a new route to create the Berry curvature change in magnetic topological materials that may lead to potential technological applications.


2021 ◽  
pp. 2006301
Author(s):  
Satya N. Guin ◽  
Qiunan Xu ◽  
Nitesh Kumar ◽  
Hsiang‐Hsi Kung ◽  
Sydney Dufresne ◽  
...  

2020 ◽  
Vol 4 (9) ◽  
Author(s):  
Nan Liu ◽  
Xuefan Niu ◽  
Yuxin Liu ◽  
Qinghua Zhang ◽  
Lin Gu ◽  
...  

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