Single source chemical vapor deposition (ssCVD) for highly luminescent inorganic halide perovskite films

Arthur Ishteev; Lev Luchnikov; Dmitry S. Muratov; Marina Voronova; Aaron Forde; Talgat Inerbaev; Vladislav Vanyushin; Danila Saranin; Khabib Yusupov; Denis Kuznetsov; Aldo Di Carlo

doi:10.1063/5.0055993

Single source chemical vapor deposition (ssCVD) for highly luminescent inorganic halide perovskite films

Applied Physics Letters ◽

10.1063/5.0055993 ◽

2021 ◽

Vol 119 (7) ◽

pp. 071901

Author(s):

Arthur Ishteev ◽

Lev Luchnikov ◽

Dmitry S. Muratov ◽

Marina Voronova ◽

Aaron Forde ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Halide Perovskite

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Aerosol-assisted chemical vapor deposition of WS2 from the single source precursor WS(S2)(S2CNEt2)2

Chemical Communications ◽

10.1039/c7cc03585c ◽

2017 ◽

Vol 53 (55) ◽

pp. 7728-7731 ◽

Cited By ~ 6

Author(s):

Nathaniel E. Richey ◽

Chandler Haines ◽

Jessica L. Tami ◽

Lisa McElwee-White

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor

WS(S2)(S2CNEt2)2 is a single source precursor for deposition of nanostructured WS2 above 350 °C.

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Aerosol-Assisted Chemical Vapor Deposition of ZnS from Thioureide Single Source Precursors

Inorganic Chemistry ◽

10.1021/acs.inorgchem.8b03363 ◽

2019 ◽

Vol 58 (4) ◽

pp. 2784-2797 ◽

Cited By ~ 3

Author(s):

Hannah S. I. Sullivan ◽

James D. Parish ◽

Prem Thongchai ◽

Gabriele Kociok-Köhn ◽

Michael S. Hill ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursors

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ChemInform Abstract: Molecular Routes to Cobalt Arsenide and Cobalt Phosphide Thin Films. Comparison of a Two-Source and a Single-Source Chemical Vapor Deposition

ChemInform ◽

10.1002/chin.199438024 ◽

2010 ◽

Vol 25 (38) ◽

pp. no-no

Author(s):

Y. SENZAKI ◽

W. L. GLADFELTER

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Cobalt Phosphide

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Hafnium diboride thin films by chemical vapor deposition from a single source precursor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2049307 ◽

2005 ◽

Vol 23 (6) ◽

pp. 1619-1625 ◽

Cited By ~ 55

Author(s):

Sreenivas Jayaraman ◽

Yu Yang ◽

Do Young Kim ◽

Gregory S. Girolami ◽

John R. Abelson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Hafnium Diboride ◽

Single Source Precursor

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CuInS2 films deposited by aerosol-assisted chemical vapor deposition using ternary single-source precursors

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.05.043 ◽

2005 ◽

Vol 116 (3) ◽

pp. 395-401 ◽

Cited By ~ 13

Author(s):

Michael H.-C. Jin ◽

Kulbinder K. Banger ◽

Jerry D. Harris ◽

Aloysius F. Hepp

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursors

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Polymeric Cyanoborane, (CNBH2)n: Single Source for Chemical Vapor Deposition of Boron Nitride Films

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1991.tb06895.x ◽

1991 ◽

Vol 74 (2) ◽

pp. 406-409 ◽

Cited By ~ 14

Author(s):

Leon Maya ◽

Hugh L. Richards

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Boron Nitride Films

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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm9905040 ◽

1999 ◽

Vol 11 (12) ◽

pp. 3430-3432 ◽

Cited By ~ 37

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.200443025 ◽

2004 ◽

Vol 35 (43) ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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Single-Source Chemical Vapor Deposition Growth of ZnO Thin Films Using Zn4O(CO2NEt2)6

Chemistry of Materials ◽

10.1021/cm0204324 ◽

2002 ◽

Vol 14 (10) ◽

pp. 4339-4342 ◽

Cited By ~ 35

Author(s):

A. J. Petrella ◽

H. Deng ◽

N. K. Roberts ◽

R. N. Lamb

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Thin Films ◽

Single Source ◽

Chemical Vapor Deposition Growth

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SiC coatings grown by liquid injection chemical vapor deposition using single source metal-organic precursors

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.10.070 ◽

2013 ◽

Vol 215 ◽

pp. 152-160 ◽

Cited By ~ 12

Author(s):

G. Boisselier ◽

F. Maury ◽

F. Schuster

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Liquid Injection ◽

Metal Organic ◽

Organic Precursors ◽

Sic Coatings

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