Aerosol-Assisted Chemical Vapor Deposition of ZnS from Thioureide Single Source Precursors

2019 ◽  
Vol 58 (4) ◽  
pp. 2784-2797 ◽  
Author(s):  
Hannah S. I. Sullivan ◽  
James D. Parish ◽  
Prem Thongchai ◽  
Gabriele Kociok-Köhn ◽  
Michael S. Hill ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Single Source Precursors

scholarly journals CuInS2 films deposited by aerosol-assisted chemical vapor deposition using ternary single-source precursors

2005 ◽  
Vol 116 (3) ◽  
pp. 395-401 ◽  
Author(s):  
Michael H.-C. Jin ◽  
Kulbinder K. Banger ◽  
Jerry D. Harris ◽  
Aloysius F. Hepp
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Single Source Precursors

scholarly journals Chemical vapor deposition of ruthenium-based layers by a single-source approach

2016 ◽  
Vol 4 (12) ◽  
pp. 2319-2328 ◽  
Author(s):  
Janine Jeschke ◽  
Stefan Möckel ◽  
Marcus Korb ◽  
Tobias Rüffer ◽  
Khaybar Assim ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Single Source Precursors

Single-source precursors Ru(CO)2(P(n-Bu)3)2(O2CR)2 allow the successful deposition of Ru(P) layers by the CVD process.

Aerosol-Assisted Chemical Vapor Deposition of CdS from Xanthate Single Source Precursors

2017 ◽  
Vol 17 (2) ◽  
pp. 907-912 ◽  
Author(s):  
Mark A. Buckingham ◽  
Amanda L. Catherall ◽  
Michael S. Hill ◽  
Andrew L. Johnson ◽  
James D. Parish
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Single Source Precursors

scholarly journals N,N-Disubstituted-N′-acylthioureas as modular ligands for deposition of transition metal sulfides

2018 ◽  
Vol 47 (8) ◽  
pp. 2719-2726 ◽  
Author(s):  
Zahra Ali ◽  
Nathaniel E. Richey ◽  
Duane C. Bock ◽  
Khalil A. Abboud ◽  
Javeed Akhtar ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Metal Sulfide ◽  
Chemical Vapor ◽  
Metal Sulfides ◽  
Single Source ◽  
Transition Metal Sulfides ◽  
Single Source Precursors

Readily available N,N-disubstituted-N′-acylthiourea complexes are single source precursors for aerosol assisted chemical vapor deposition of metal sulfide thin films.

Correction to Organotin Dithiocarbamates: Single-Source Precursors for Tin Sulfide Thin Films by Aerosol-Assisted Chemical Vapor Deposition (AACVD)

2014 ◽  
Vol 26 (10) ◽  
pp. 3348-3348 ◽  
Author(s):  
Karthik Ramasamy ◽  
Vladimir L. Kuznetsov ◽  
Kandasamy Gopal ◽  
Mohammad A. Malik ◽  
James Raftery ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tin Sulfide ◽  
Single Source ◽  
Single Source Precursors
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