Oxidation Kinetics of Low-Sn Zircaloy-4 at the Temperature Range from 773 to 1,573K

2003 ◽  
Vol 40 (4) ◽  
pp. 213-219 ◽  
Author(s):  
Fumihisa NAGASE ◽  
Takashi OTOMO ◽  
Hiroshi UETSUKA
Keyword(s):  
Oxidation Kinetics ◽  
Temperature Range ◽  
Kinetics Of

Oxidation kinetics of silicon carbide in steam at temperature range of 1400 to 1800 °C studied by laser heating

2020 ◽  
Vol 529 ◽  
pp. 151939 ◽  
Author(s):  
Hai Vu Pham ◽  
Yuji Nagae ◽  
Masaki Kurata ◽  
David Bottomley ◽  
Kenichiro Furumoto
Keyword(s):  
Silicon Carbide ◽  
Oxidation Kinetics ◽  
Laser Heating ◽  
Temperature Range ◽  
Kinetics Of

Oxidation kinetics of niobium in the temperature range of 873 to 1083 K

1980 ◽  
Vol 11 (8) ◽  
pp. 1385-1389 ◽  
Author(s):  
James T. Clenny ◽  
Casimir J. Rosa
Keyword(s):  
Oxidation Kinetics ◽  
Temperature Range ◽  
Kinetics Of

Impact Of Synthesis Route on the Water Oxidation Kinetics of Hematite Photoanodes

2020 ◽  
Author(s):  
Camilo A. Mesa ◽  
Ludmilla Steier ◽  
Benjamin Moss ◽  
Laia Francàs ◽  
James E. Thorne ◽  
...  
Keyword(s):  
Oxygen Vacancy ◽  
Reaction Kinetics ◽  
Water Oxidation ◽  
Oxidation Kinetics ◽  
Oxidation Reaction ◽  
Charge Accumulation ◽  
Optical Signals ◽  
Current Voltage ◽  
Voltage Performance ◽  
Kinetics Of

<p><i>Operando</i> spectroelectrochemical analysis is used to determine the water oxidation reaction kinetics for hematite photoanodes prepared using four different synthetic procedures. Whilst these photoanodes exhibit very different current / voltage performance, their underlying water oxidation kinetics are found to be almost invariant. Lower photoanode performance was found to correlate with the observation of optical signals indicative of charge accumulation in mid-gap oxygen vacancy states, indicating these states do not contribute directly to water oxidation.</p>

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