Gas phase optical emission spectroscopy during remote plasma chemical vapour deposition of GaN and relation to the growth dynamics

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/4/045201 ◽

2011 ◽

Vol 44 (4) ◽

pp. 045201 ◽

Author(s):

Cormac Corr ◽

Rod Boswell ◽

Robert Carman

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Growth Dynamics ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995570 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-593-C5-600 ◽

Author(s):

C. Tixier ◽

P. Tristant ◽

J. Desmaison ◽

D. Merle

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Growth Rates ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission

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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90241-0 ◽

1994 ◽

Vol 68-69 ◽

pp. 702-707 ◽

Author(s):

C. Barholm-Hansen ◽

M.D. Bentzon ◽

M.E. Vigild ◽

E. Findeisen ◽

R. Feidenhans'l ◽

...

Keyword(s):

Process Control ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission

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Synthesis of cubic BN from the gas phase by a new plasma chemical vapour deposition method using r.f. waves and a tungsten filament

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90066-l ◽

1990 ◽

Vol 43-44 ◽

pp. 116-127 ◽

Author(s):

Yukio Ichinose ◽

Hidetoshi Saitoh ◽

Yoshihiko Hirotsu

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Control of Lithium-t-Butoxide Addition during Chemical Vapour Deposition of Li-Doped Diamond Films by Optical Emission Spectroscopy

phys stat sol (a) ◽

10.1002/(sici)1521-396x(199907)174:1<65::aid-pssa65>3.0.co;2-w ◽

1999 ◽

Vol 174 (1) ◽

pp. 65-72 ◽

Author(s):

H. Sternschulte ◽

M. Schreck ◽

B. Stritzker ◽

A. Bergmaier ◽

G. Dollinger

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Optical Emission

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Calculation of the Precursor Flux from Optical Emission Spectroscopy Data in Plasma Enhanced Chemical Vapour Deposition of Silane and its Correlation with the Deposition Rate

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.3955 ◽

2002 ◽

Vol 41 (Part 1, No. 6A) ◽

pp. 3955-3960 ◽

Author(s):

Partha Pratim Ray ◽

Namita Dutta Gupta ◽

Partha Chaudhuri

Keyword(s):

Deposition Rate ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission ◽

Spectroscopy Data

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SYNTHESIS OF CUBIC BN FROM THE GAS PHASE BY A NEW PLASMA CHEMICAL VAPOUR DEPOSITION METHOD USING R.F. WAVES AND A TUNGSTEN FILAMENT

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50020-6 ◽

1990 ◽

pp. 116-127

Author(s):

YUKIO ICHINOSE ◽

HIDETOSHI SAITOH ◽

YOSHIHIKO HIROTSU

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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