scholarly journals Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

1995 ◽  
Vol 05 (C5) ◽  
pp. C5-593-C5-600 ◽  
Author(s):  
C. Tixier ◽  
P. Tristant ◽  
J. Desmaison ◽  
D. Merle
Keyword(s):  
Chemical Vapour Deposition ◽  
Amorphous Carbon ◽  
Growth Rates ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Optical Emission

A Comparison of the Surface Properties of DLC and Nanocrystalline Diamond

2007 ◽  
Vol 336-338 ◽  
pp. 1776-1779
Author(s):  
Chong Mu Lee ◽  
Kyung Ha Kim
Keyword(s):  
Chemical Vapour Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Scanning Force Microscopy ◽  
Nanocrystalline Diamond ◽  
Hard Coatings

Diamond-like carbon (DLC) films have been deposited by radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) with different Ar-CH4 mixtures. Nanocrystalline diamond films have been deposited by microwave plasma-enhanced chemical vapour deposition (MPCVD), using Ar-H2-CH4 mixtures. X-ray photoelectron spectroscopy (XPS) and nanotribological investigation (by scanning force microscopy) have been used to compare the mechanical properties and structures of these films. Highly orientated and non-orientated microcrystalline diamond films and MPCVD-produced amorphous carbon have also been studied by way of comparison. The diamond films exhibit a linear relationship between roughness and the coefficient of friction. The DLC and amorphous carbon have higher friction coefficients than the best performing diamond film, but may more easily be deposited as smooth coating. Possible applications for these various carbon-based films include microelectromechanical components, for which smooth, hard coatings are required.

Diamond growth by microwave plasma enhanced chemical vapour deposition: Optical emission characterisation and effect argon addition

2004 ◽  
Vol 201 (11) ◽  
pp. 2425-2431 ◽  
Author(s):  
V. Mortet ◽  
Z. Hubicka ◽  
V. Vorlicek ◽  
K. Jurek ◽  
J. Rosa ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Optical Emission ◽  
Diamond Growth
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