Inner Surface Modification of a Tube by Magnetic Glow-Arc Plasma Source Ion Implantation

2006 ◽  
Vol 23 (5) ◽  
pp. 1241-1244 ◽  
Author(s):  
Zhang Gu-Ling ◽  
Wang Jiu-Li ◽  
Wu Xing-Fang ◽  
Feng Wen-Ran ◽  
Chen Guang-Liang ◽  
...  
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Plasma Source ◽  
Arc Plasma ◽  
Inner Surface ◽  
Plasma Source Ion Implantation

Metal Plasma Source Ion Implantation Using a Pulsed Cathodic Arc

2007 ◽  
Vol 534-536 ◽  
pp. 1397-1400
Author(s):  
S.Y. Chun
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
High Voltage ◽  
Plasma Deposition ◽  
Processing System ◽  
Plasma Source ◽  
Arc Plasma ◽  
Aluminum Ions ◽  
Plasma Source Ion Implantation ◽  
Cathodic Arc

Combining nano-designed plasma source ion implantation and deposition (PSII&D) method has been developed with the pulsed cathodic arc plasma to make a processing system suitable for surface modification of materials such as metals, plastics and ceramics. By controlling the arc plasma pulse and the target pulse, the surface modification can be changed from plasma deposition to ion implantation. Various versions of applying high-voltage pulse bias are described and compared with other methods. Microstructural changes of the nanometered gold films with/without a high voltage bias, concentration profiles of implanted aluminum ions on the surfaces of complex-shaped trench are discussed.

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