The effect of ionization threshold softness on the temperature dependence of the impact ionization coefficient

2003 ◽  
Vol 18 (7) ◽  
pp. 689-692 ◽  
Author(s):  
C Groves ◽  
J P R David ◽  
G J Rees
2013 ◽  
Vol 91 (6) ◽  
pp. 483-485 ◽  
Author(s):  
A. Darbandi ◽  
O. Rubel

Impact ionization coefficient is a critical parameter that determines the multiplication gain in avalanche photodiodes. The impact ionization coefficient is closely related to the ionization threshold, Eth, which is determined by the band dispersion of the semiconducting material used in detectors. The ionization threshold energy is commonly calculated based on a parabolic band assumption, which provides only a crude approximation. Here we present a first principle study of the ionization threshold energy through an analysis of the electronic structure of trigonal selenium. It is shown that the excess energy of primary charge carriers required to initiate the impact ionization in trigonal selenium can be as low as the band gap, Eg, which is a sharp contrast to the parabolic band approximation that implies Eth = 3/2Eg. Such a low Eth value is a favourable factor for impact ionization.


2001 ◽  
Vol 680 ◽  
Author(s):  
You-Sang Lee ◽  
Min-Koo Han ◽  
Yearn-Ik Choi

ABSTRACTThe breakdown voltage of wurtzite and zinc-blende GaN rectifiers as function of a doping concentration and the width of epitaxial layer were successfully modeled in the reach-through case. The breakdown voltage was derived by the impact ionization integral employing the effective impact ionization coefficient and an accurate approximation. Our model shows that the breakdown voltage of wurtzite GaN rectifier was larger than those of zinc-blende GaN rectifier and SiC rectifiers including 4H-SiC and 6H-SiC in the condition that both the thickness and doping concentration of epitaxial layer are identical.


1998 ◽  
Vol 512 ◽  
Author(s):  
You-Sang Lee ◽  
D.-S. Byeon ◽  
Y.-I. Choi ◽  
I.-Y. Park ◽  
Min-Koo Han

ABSTRACTThe closed-form analytic solutions for the breakdown voltage of 6H-SiC RTD, reachthrough diode, having the structure of p+-n-n+, are successfully derived by solving the impact ionization integral using effective ionization coefficient in the reachthrough condition. In the region of the lowly doped epitaxial layer, the breakdown voltages of 6H-SiC RTD nearly constant with the increased doping concentration. Also the breakdown voltages of 6H-SiC RTD decrease, in the region of the highly doped epitaxial layer, which coincides with Baliga'seq. [1].


2003 ◽  
Vol 94 (1) ◽  
pp. 423-430 ◽  
Author(s):  
Louis Tirino ◽  
Michael Weber ◽  
Kevin F. Brennan ◽  
Enrico Bellotti ◽  
Michele Goano

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