Quantum chemical study of the initial surface reactions in atomic layer deposition of TiN on the SiO2 surface

2006 ◽  
Vol 18 (26) ◽  
pp. 5937-5944 ◽  
Author(s):  
Hong-Liang Lu ◽  
Wei Chen ◽  
Shi-Jin Ding ◽  
Min Xu ◽  
David Wei Zhang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Surface Reactions ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Initial Surface ◽  
Sio2 Surface ◽  
Layer Deposition

A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface

2004 ◽  
Vol 550 (1-3) ◽  
pp. 199-212 ◽  
Author(s):  
Joseph H. Han ◽  
Guilian Gao ◽  
Yuniarto Widjaja ◽  
Eric Garfunkel ◽  
Charles B. Musgrave
Keyword(s):  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Sio2 Surface ◽  
Layer Deposition

Initial surface reactions in atomic layer deposition of Al2O3on the hydroxylated GaAs(001)-4 × 2 surface

2005 ◽  
Vol 17 (48) ◽  
pp. 7517-7522 ◽  
Author(s):  
Hong-Liang Lu ◽  
Wei Chen ◽  
Shi-Jin Ding ◽  
Min Xu ◽  
David Wei Zhang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Reactions ◽  
Atomic Layer ◽  
Initial Surface ◽  
Layer Deposition
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