Quantum Chemical Study of the Effect of Precursor Stereochemistry on Dissociative Chemisorption and Surface Redox Reactions During the Atomic Layer Deposition of the Transition Metal Copper

2015 ◽  
Vol 119 (11) ◽  
pp. 5914-5927 ◽  
Author(s):  
Gangotri Dey ◽  
Simon D. Elliott
Keyword(s):  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Redox Reactions ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Dissociative Chemisorption ◽  
Layer Deposition ◽  
Surface Redox

A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface

2004 ◽  
Vol 550 (1-3) ◽  
pp. 199-212 ◽  
Author(s):  
Joseph H. Han ◽  
Guilian Gao ◽  
Yuniarto Widjaja ◽  
Eric Garfunkel ◽  
Charles B. Musgrave
Keyword(s):  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Sio2 Surface ◽  
Layer Deposition

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

2015 ◽  
Vol 44 (22) ◽  
pp. 10188-10199 ◽  
Author(s):  
Gangotri Dey ◽  
Jacqueline S. Wrench ◽  
Dirk J. Hagen ◽  
Lynette Keeney ◽  
Simon D. Elliott
Keyword(s):  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Solution Phase ◽  
Layer Deposition ◽  
Phase Evaluation

We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors.

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