A Quantum Chemical Study of the Atomic Layer Deposition of Al2O3Using AlCl3and H2O as Precursors

2004 ◽  
Vol 108 (18) ◽  
pp. 5718-5725 ◽  
Author(s):  
Annica Heyman ◽  
Charles B. Musgrave
Keyword(s):  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Layer Deposition

A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface

2004 ◽  
Vol 550 (1-3) ◽  
pp. 199-212 ◽  
Author(s):  
Joseph H. Han ◽  
Guilian Gao ◽  
Yuniarto Widjaja ◽  
Eric Garfunkel ◽  
Charles B. Musgrave
Keyword(s):  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Quantum Chemical Study ◽  
Atomic Layer ◽  
Chemical Study ◽  
Sio2 Surface ◽  
Layer Deposition

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

2015 ◽  
Vol 44 (22) ◽  
pp. 10188-10199 ◽  
Author(s):  
Gangotri Dey ◽  
Jacqueline S. Wrench ◽  
Dirk J. Hagen ◽  
Lynette Keeney ◽  
Simon D. Elliott
Keyword(s):  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Quantum Chemical ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Solution Phase ◽  
Layer Deposition ◽  
Phase Evaluation

We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors.

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