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High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system
Journal of Micromechanics and Microengineering
◽
10.1088/0960-1317/14/5/010
◽
2004
◽
Vol 14
(5)
◽
pp. 722-726
◽
Cited By ~ 9
Author(s):
Lin Wang
◽
Yohannes M Desta
◽
Rainer K Fettig
◽
Jost Goettert
◽
Herbert Hein
◽
...
Keyword(s):
Electron Beam
◽
High Resolution
◽
Electron Beam Lithography
◽
X Ray
◽
Lithography System
◽
Mask Fabrication
Download Full-text
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References
Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication
10.1117/12.195806
◽
1994
◽
Author(s):
Denise M. Puisto
◽
Mark Lawliss
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Lithography System
◽
Mask Fabrication
Download Full-text
Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.585306
◽
1991
◽
Vol 9
(6)
◽
pp. 3292
◽
Cited By ~ 3
Author(s):
K. W. Rhee
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
◽
Lithography System
Download Full-text
100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.585998
◽
1992
◽
Vol 10
(6)
◽
pp. 2764
◽
Cited By ~ 12
Author(s):
M. A. McCord
Keyword(s):
Electron Beam
◽
High Resolution
◽
Field Emission
◽
Electron Beam Lithography
◽
Thermal Field
◽
X Ray
◽
Emission Electron
Download Full-text
High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography
Microelectronic Engineering
◽
10.1016/s0167-9317(01)00479-8
◽
2001
◽
Vol 57-58
◽
pp. 761-767
◽
Cited By ~ 5
Author(s):
Andreas Schmidt
◽
Gerhard Himmelsbach
◽
Regina Lüttge
◽
Dieter Adam
◽
Falk Hoke
◽
...
Keyword(s):
Electron Beam
◽
High Precision
◽
Electron Beam Lithography
◽
X Ray
◽
Mask Fabrication
Download Full-text
130 kV High-Resolution Electron Beam Lithography System for Sub-10-nm Nanofabrication
Japanese Journal of Applied Physics
◽
10.7567/jjap.52.06gb01
◽
2013
◽
Vol 52
(6S)
◽
pp. 06GB01
◽
Cited By ~ 5
Author(s):
Teruaki Okino
◽
Yukio Kuba
◽
Masahiro Shibata
◽
Hideyuki Ohyi
Keyword(s):
Electron Beam
◽
High Resolution
◽
Electron Beam Lithography
◽
Resolution Electron
◽
Lithography System
Download Full-text
Line stitching in servo-assisted electron beam lithography system
2011 IEEE/ASME International Conference on Advanced Intelligent Mechatronics (AIM)
◽
10.1109/aim.2011.6027026
◽
2011
◽
Author(s):
Jia-Yush Yen
◽
Lien-Sheng Chen
◽
Pablo Chiu
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Lithography System
Download Full-text
A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
Microelectronic Engineering
◽
10.1016/0167-9317(91)90069-p
◽
1991
◽
Vol 13
(1-4)
◽
pp. 165-172
◽
Cited By ~ 3
Author(s):
M.G. Rosenfield
◽
S.A. Rishton
◽
D.P. Kern
◽
D.E. Seeger
◽
C.A. Whiting
Keyword(s):
Electron Beam
◽
Proximity Effects
◽
High Electron
◽
X Ray
◽
Mask Fabrication
Download Full-text
X-ray zone plates fabricated using electron beam lithography and reactive ion etching
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.583242
◽
1985
◽
Vol 3
(1)
◽
pp. 265
◽
Cited By ~ 6
Author(s):
H. Aritome
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Reactive Ion Etching
◽
Ion Etching
◽
X Ray
◽
Zone Plates
Download Full-text
High resolution spin-on electron beam lithography resist with exceptional dry etching resistance
Applied Materials Today
◽
10.1016/j.apmt.2015.06.003
◽
2015
◽
Vol 1
(1)
◽
pp. 13-19
◽
Cited By ~ 6
Author(s):
G. Grenci
◽
E. Zanchetta
◽
A. Pozzato
◽
G. Della Giustina
◽
G. Brusatin
◽
...
Keyword(s):
Electron Beam
◽
High Resolution
◽
Electron Beam Lithography
◽
Dry Etching
Download Full-text
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.589042
◽
1996
◽
Vol 14
(6)
◽
pp. 4308
◽
Cited By ~ 4
Author(s):
D. L. Laird
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
X Ray
Download Full-text
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