The Diagnosis of Plasma Parameters in Surface Alloying Technique by Optical Emission Spectrometry

2006 ◽  
Vol 8 (4) ◽  
pp. 461-463 ◽  
Author(s):  
Fu Yabo ◽  
Zhang Yuefei ◽  
Chen Qiang ◽  
Zhang Guangqiu ◽  
Gao Yuan ◽  
...  
2020 ◽  
Vol 10 (22) ◽  
pp. 8117
Author(s):  
Chi Chen ◽  
Wenjie Fu ◽  
Chaoyang Zhang ◽  
Dun Lu ◽  
Meng Han ◽  
...  

The Langmuir probe is a feasible method to measure plasma parameters. However, as the reaction progresses in the discharged plasma, the contamination would be attached to the probe surface and lead to a higher incorrect electron temperature. Then, the electron density cannot be obtained. This paper reports a simple approach to combining the Langmuir probe and the optical emission spectrometry (OES), which can be used to obtain the electron temperature to solve this problem. Even the Langmuir probe is contaminative, the probe current–voltage (I–V) curve with the OES spectra also gives the approximate electron temperature and density. A homemade coaxial line microwave plasma source driven by a 2.45 GHz magnetron was adopted to verify this mothed, and the electron temperature and density in different pressure (40–80 Pa) and microwave power (400–800 W) were measured to verify that it is feasible.


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